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Gas Pressure Sintering Furnace For Cemented Carbide Precision Ceramic Stainless Steel Coper Based Alloy Materials

Working Temperature: 1200-1800℃

Gas Pressure: 1-10MPa

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Silicon Carbide CVD Coating Furnace For Graphite Susceptor Or Etching Ring

Packaging Details: wooden cases

Delivery Time: 5-6monthes

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Customizable TiC/TiN/TiCN/Al2O3 Coating CVD Furnace with 700-1050C Process Temperature

Process Temperature((℃): 700-1050

Types Of Coating: TiC、TiN、TiCN、a-AL2O3、K-AI2O3

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Precise Temperature Control Vacuum Heat Treatment Brazing Furnace Max. Working Temperature 1200C Temperature Uniformity ≤±3

Max.working Temperature(℃): 1200

Temperature Uniformity(℃）: ≤±3

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Chemical Vapor Deposition Coating Furnace For Cemented/tungsten Carbide Cutting Tool

Process Temperature((℃): 700-1050

Precursors And Process Gases: TiCL4,AICL3,CH3CN,H2,N2,Ar,CH,CO,CO2,HCI,H2S

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High Energy Efficiency Gas Pressure Sintering Furnace for Uniform Temperature Atmosphere and Rapid Cooling

Cooling Time: ≤1h/4h/5h/6h/8h(Empty Furnace,cooling From Sintering Temperature 1450-100°C)Water Temperature≤26℃,water Pressure 2-3bar.

Size: Customized

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Max Temperature 1600℃ Vacuum Pressure Furnace , Sinter HIP Furnace Wax Collection Rate 98%

Name: Vacuum Pressure Furnace

Wax-collection Rate: 98%

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User friendly Ceramics Vacuum Sintering Furnace for Cemented Carbide

Usage: Sintering Furnace

Warranty: 1 Year

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High Temperature Vacuum Vapor Deposition Furnace with 1100C Maximum Temperature Range

Reactor: 2pcs

Maximum Temperature:: 1100℃

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SIC Silicon Carbide High Temperature Vacuum Sintering Protective Atmosphere Heat Treatment Furnace

Paint Color: Gray, Blue, White, Black. (Can Be Customized)

Furnace Shell Service Life: 20 Years

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1500C CVD SIC Epitaxy Growth Furnace for Silicon Carbide Growth in 100010001500mm Effective Space

Effecive Space(mm): 1000*1000*1500

Heating Power(KVA): 300

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Advanced CVD/CVI Vapor Deposition Furnace for TiC TiN TiCN a-AL2O3 and K-AI2O3 Coating at 700-1050C Process Temperature

Process Temperature((℃): 700-1050

Types Of Coating: TiC、TiN、TiCN、a-AL2O3、K-AI2O3

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Chemical Vapor Deposition Coating Furnace With TiCL4,AICL3 Precursors And Process Gases

Process Temperature((℃): 700-1050

Precursors And Process Gases: TiCL4,AICL3,CH3CN,H2,N2,Ar,CH,CO,CO2,HCI,H2S

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Honeycomb Ceramic CVD Coating Furnace for 700-1050C Process Temperature and Optional Off Gas Neutralizer

Process Temperature((℃): 700-1050

Precursors And Process Gases: TiCL4,AICL3,CH3CN,H2,N2,Ar,CH,CO,CO2,HCI,H2S

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High Temperature Industrial Purification Furnace For Graphite Materials

Max.working Temperature: 2400℃

Temperature Uniformity: ≤±10℃

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Special Ceramics Gas Pressure Sintering Furnace with 2000C Maximum Temperature

Forming Agent: Paraffin,PEG,Rubber,(C12H22O5)n Etc.

Temperature Measurement: W-Re 5/26 Thermocouple+infrared Pyrometer

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Large Capacity Vacuum Furnace For Heat Treatment Specifications RDE-GWL-5518

Horizontal Industrial Vacuum Furnace With Cylindrical Structure Heating Elements

Gas Pressure Sintering Furnace For Cemented Carbide Precision Ceramic Stainless Steel Coper Based Alloy Materials

Silicon Carbide CVD Coating Furnace For Graphite Susceptor Or Etching Ring

Customizable TiC/TiN/TiCN/Al2O3 Coating CVD Furnace with 700-1050C Process Temperature

Precise Temperature Control Vacuum Heat Treatment Brazing Furnace Max. Working Temperature 1200C Temperature Uniformity ≤±3

Chemical Vapor Deposition Coating Furnace For Cemented/tungsten Carbide Cutting Tool

High Energy Efficiency Gas Pressure Sintering Furnace for Uniform Temperature Atmosphere and Rapid Cooling

Max Temperature 1600℃ Vacuum Pressure Furnace , Sinter HIP Furnace Wax Collection Rate 98%

User friendly Ceramics Vacuum Sintering Furnace for Cemented Carbide

High Temperature Vacuum Vapor Deposition Furnace with 1100C Maximum Temperature Range

SIC Silicon Carbide High Temperature Vacuum Sintering Protective Atmosphere Heat Treatment Furnace

1500C CVD SIC Epitaxy Growth Furnace for Silicon Carbide Growth in 100010001500mm Effective Space

Advanced CVD/CVI Vapor Deposition Furnace for TiC TiN TiCN a-AL2O3 and K-AI2O3 Coating at 700-1050C Process Temperature

Chemical Vapor Deposition Coating Furnace With TiCL4,AICL3 Precursors And Process Gases

Honeycomb Ceramic CVD Coating Furnace for 700-1050C Process Temperature and Optional Off Gas Neutralizer

High Temperature Industrial Purification Furnace For Graphite Materials

Special Ceramics Gas Pressure Sintering Furnace with 2000C Maximum Temperature