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Customizable 900-1050C Chemical Vapor Aluminizing Furnace with Hf Zr and Si Codeposition

Temp.of Deposition((℃): 900-1050

Process Pressure(mbar): 100-300

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AICL3 Precursors Chemical Vapor Deposition Furnace for Cutting Tools at 700-1050C Process Temperature

Process Temperature((℃): 700-1050

Precursors And Process Gases: TiCL4,AICL3,CH3CN,H2,N2,Ar,CH,CO,CO2,HCI,H2S

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High Temperature Coating Process Equipment with Precursors and Process Gases TiCl4 AlCl3 CH3CN H2 N2 Ar CH4 CO CO2 HCl H2S

Precursors And Process Gases: TiCl4、AlCl3、CH3CN、H2、N2、Ar、CH4、CO、CO2、HCl、H2S

Coating Substrates: Metal, Ceramic, Glass, Etc.

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Temperature Alloy Coating Chamber Electric Resistance Heating CVD Furnace for Customizable Size Metal or Ceramic Substrates

Coating Method: Chemical Vapor Deposition (CVD)

Total Power: About 40/50/60/80KW

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high Temperture Alloy Coating Chamber Chemical Vapor Deposition Coating Machine For Tungsten Carbide Cutting Tool

Precursors And Process Gases: TiCl4、AlCl3、CH3CN、H2、N2、Ar、CH4、CO、CO2、HCl、H2S

Coating Equipment Size: Customizable

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Electric Resistence Heating CVD Coating Machine for High Temperature Coating Up To 1000°C Chinese and Turn-key Project

Total Power: About 40/50/60/80KW

Coating Substrates: Metal, Ceramic, Glass, Etc.

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Advanced CVD Coating Machine for Ceramic Substrate Strong Coating Adhesion Total Power About 40/50/60/80KW

Coating Substrates: Metal, Ceramic, Glass, Etc.

Coating Adhesion: Strong

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Honeycomb Ceramic CVD Coating Furnace for 700-1050C Process Temperature and Optional Off Gas Neutralizer

Process Temperature((℃): 700-1050

Precursors And Process Gases: TiCL4,AICL3,CH3CN,H2,N2,Ar,CH,CO,CO2,HCI,H2S

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Roll Sealing Wheel CVD Coating Furnace with CO Precursors and Second Stage Gas Distributor

Process Temperature((℃): 700-1050

Precursors And Process Gases: TiCL4,AICL3,CH3CN,H2,N2,Ar,CH,CO,CO2,HCI,H2S

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Chemical Vapor Deposition Coating Furnace For Cemented/tungsten Carbide Cutting Tool

Process Temperature((℃): 700-1050

Precursors And Process Gases: TiCL4,AICL3,CH3CN,H2,N2,Ar,CH,CO,CO2,HCI,H2S

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Chemical Vapor Deposition Coating Furnace With TiCL4,AICL3 Precursors And Process Gases

Process Temperature((℃): 700-1050

Precursors And Process Gases: TiCL4,AICL3,CH3CN,H2,N2,Ar,CH,CO,CO2,HCI,H2S

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Advanced CVD/CVI Vapor Deposition Furnace for TiC TiN TiCN a-AL2O3 and K-AI2O3 Coating at 700-1050C Process Temperature

Process Temperature((℃): 700-1050

Types Of Coating: TiC、TiN、TiCN、a-AL2O3、K-AI2O3

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Customized Cvd Lab Vacuum Furnace Chemical Vapor Deposition Cvd Coating Furnace

Process Temperature((℃): 700-1050

Types Of Coating: TiC、TiN、TiCN、a-AL2O3、K-AI2O3

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Customizable TiC/TiN/TiCN/Al2O3 Coating CVD Furnace with 700-1050C Process Temperature

Process Temperature((℃): 700-1050

Types Of Coating: TiC、TiN、TiCN、a-AL2O3、K-AI2O3

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Vertical Large Pyrolytic Carbon CVI Furnace Top/bottom Load with Max. Working Temperature of 1300C

Max.working Temperature(℃): 1300

Temperature Uniformity(℃）: ≤±7

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HTCVD Silicon Carbide CVD SIC Epitaxy Growth Furnace Multiple Temperature Control Zones

Effecive Space(mm): 1000*1000*1500

Heating Power(KVA): 300

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CVD Coating Machine

Sinter HIP Furnace

Gas Pressure Sintering Furnace

Vacuum Sintering Furnace

MIM Sintering Furnace

Metal Sintering Furnace

Industrial Vacuum Furnace

High Temperature Vacuum Furnace

Vacuum Heat Treatment Furnace

Ceramic Sintering Furnace

High Vacuum Furnace

Sintering Furnace Accessories

Silicon Carbide Furnace