Temp.of Deposition((℃): 900-1050
Process Pressure(mbar): 100-300
Process Temperature((℃): 700-1050
Precursors And Process Gases: TiCL4,AICL3,CH3CN,H2,N2,Ar,CH,CO,CO2,HCI,H2S
Precursors And Process Gases: TiCl4、AlCl3、CH3CN、H2、N2、Ar、CH4、CO、CO2、HCl、H2S
Coating Substrates: Metal, Ceramic, Glass, Etc.
Coating Method: Chemical Vapor Deposition (CVD)
Total Power: About 40/50/60/80KW
Precursors And Process Gases: TiCl4、AlCl3、CH3CN、H2、N2、Ar、CH4、CO、CO2、HCl、H2S
Coating Equipment Size: Customizable
Total Power: About 40/50/60/80KW
Coating Substrates: Metal, Ceramic, Glass, Etc.
Coating Substrates: Metal, Ceramic, Glass, Etc.
Coating Adhesion: Strong
Process Temperature((℃): 700-1050
Precursors And Process Gases: TiCL4,AICL3,CH3CN,H2,N2,Ar,CH,CO,CO2,HCI,H2S
Process Temperature((℃): 700-1050
Precursors And Process Gases: TiCL4,AICL3,CH3CN,H2,N2,Ar,CH,CO,CO2,HCI,H2S
Process Temperature((℃): 700-1050
Precursors And Process Gases: TiCL4,AICL3,CH3CN,H2,N2,Ar,CH,CO,CO2,HCI,H2S
Process Temperature((℃): 700-1050
Precursors And Process Gases: TiCL4,AICL3,CH3CN,H2,N2,Ar,CH,CO,CO2,HCI,H2S
Process Temperature((℃): 700-1050
Types Of Coating: TiC、TiN、TiCN、a-AL2O3、K-AI2O3
Process Temperature((℃): 700-1050
Types Of Coating: TiC、TiN、TiCN、a-AL2O3、K-AI2O3
Process Temperature((℃): 700-1050
Types Of Coating: TiC、TiN、TiCN、a-AL2O3、K-AI2O3
Max.working Temperature(℃): 1300
Temperature Uniformity(℃): ≤±7
Effecive Space(mm): 1000*1000*1500
Heating Power(KVA): 300
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