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Best Seller Multifunctional Recycle Heating Gas Pressure Sintering Furnace

Structure: Single Chamber, Horizontal Type, Front And Back Furnace Door

Dimension: 500*500*1800

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80kg Load High Temperature Vacuum Furnace For Sintering Cemented Carbide

Structure: Single Chamber,horizental Type

Heating Element: Graphite

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Accurate Temperature Control Vacuum Sintering with High-temperature Resistant Carbon Composite K-type Thermocouple

Heating Element: Graphite, Molybdenum

Temperature Control System: PID Automatic Control

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320KVA Siemens PLC Control High Temperature Vacuum Furnace

Structure: Single Chamber,horizental Type

Dimension: Customized

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High Temperature Vacuum Sintering Furnace With Dewaxing Function

Structure: Single Chamber,horizental Type

Dimension: 500*500*1800

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MT-CVD HT-CVD Coating Furnace with Great Coating Quality and Customizable Reactor

Coating Temperature: 200-1050℃

Cooling System: 2 Sets Of High-performance Water-cooled Condensate Traps

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Good price Customizable 900-1050C Chemical Vapor Aluminizing Furnace with Hf Zr and Si Codeposition online Video

Customizable 900-1050C Chemical Vapor Aluminizing Furnace with Hf Zr and Si Codeposition

Temp.of Deposition((℃): 900-1050

Process Pressure(mbar): 100-300

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Good price Customizable TiC/TiN/TiCN/Al2O3 Coating CVD Furnace with 700-1050C Process Temperature online Video

Customizable TiC/TiN/TiCN/Al2O3 Coating CVD Furnace with 700-1050C Process Temperature

Process Temperature((℃): 700-1050

Types Of Coating: TiC、TiN、TiCN、a-AL2O3、K-AI2O3

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Good price Customized Cvd Lab Vacuum Furnace Chemical Vapor Deposition Cvd Coating Furnace online Video

Customized Cvd Lab Vacuum Furnace Chemical Vapor Deposition Cvd Coating Furnace

Process Temperature((℃): 700-1050

Types Of Coating: TiC、TiN、TiCN、a-AL2O3、K-AI2O3

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Good price Advanced CVD/CVI Vapor Deposition Furnace for TiC TiN TiCN a-AL2O3 and K-AI2O3 Coating at 700-1050C Process Temperature online Video

Advanced CVD/CVI Vapor Deposition Furnace for TiC TiN TiCN a-AL2O3 and K-AI2O3 Coating at 700-1050C Process Temperature

Process Temperature((℃): 700-1050

Types Of Coating: TiC、TiN、TiCN、a-AL2O3、K-AI2O3

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Good price Chemical Vapor Deposition Coating Furnace With TiCL4,AICL3 Precursors And Process Gases online Video

Chemical Vapor Deposition Coating Furnace With TiCL4,AICL3 Precursors And Process Gases

Process Temperature((℃): 700-1050

Precursors And Process Gases: TiCL4,AICL3,CH3CN,H2,N2,Ar,CH,CO,CO2,HCI,H2S

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Chinese Factory ISO CE Certificate Vacuum Pressureless Furnace With Max. Working Temperature 2500C Temperature

Max.working Temperature: 2500℃

Temperature Uniformity: ≤±5℃

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Good price 1500C CVD SIC Epitaxy Growth Furnace for Silicon Carbide Growth in 1000*1000*1500mm Effective Space online Video

1500C CVD SIC Epitaxy Growth Furnace for Silicon Carbide Growth in 1000*1000*1500mm Effective Space

Effecive Space(mm): 1000*1000*1500

Heating Power(KVA): 300

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Good price Precision 1800C Silicon Carbide Reaction Sintering Furnace with ≤±5C Temperature Uniformity online Video

Precision 1800C Silicon Carbide Reaction Sintering Furnace with ≤±5C Temperature Uniformity

Max.working Temperature: 1800℃

Temperature Uniformity: ≤±5℃

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Unidirectional or bidirectional high temperature and pressure sintering furnace for material high-density processing

Max.working Temperature(℃): 2100

Temperature Uniformity(℃): ≤±5

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Good price Precision 1800C Silicon Carbide Reaction Sintering Furnace with ≤±5C Temperature Uniformity online Video

Precision 1800C Silicon Carbide Reaction Sintering Furnace with ≤±5C Temperature Uniformity

Max.working Temperature: 1800℃

Temperature Uniformity: ≤±5℃

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