vacuum furnace equipment (390) Online Manufacturer
Temp.of Deposition((℃): 900-1050
Process Pressure(mbar): 100-300
Process Temperature((℃): 700-1050
Precursors And Process Gases: TiCL4,AICL3,CH3CN,H2,N2,Ar,CH,CO,CO2,HCI,H2S
Structure: Single Chamber,horizental Type
Dimension: Customized
Reaction Chamber: 2 Pcs
Maximum Temperature:: 1100℃
Reactor: 2 Pcs
Maximum Temperature:: 1100℃
Reaction Chamber: 2 Pcs
Maximum Temperature:: 1100℃
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