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Customizable TiC/TiN/TiCN/Al2O3 Coating CVD Furnace with 700-1050C Process Temperature

Process Temperature((℃): 700-1050

Types Of Coating: TiC、TiN、TiCN、a-AL2O3、K-AI2O3

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Advanced CVD/CVI Vapor Deposition Furnace for TiC TiN TiCN a-AL2O3 and K-AI2O3 Coating at 700-1050C Process Temperature

Process Temperature((℃): 700-1050

Types Of Coating: TiC、TiN、TiCN、a-AL2O3、K-AI2O3

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Chemical Vapor Deposition Coating Furnace With TiCL4,AICL3 Precursors And Process Gases

Process Temperature((℃): 700-1050

Precursors And Process Gases: TiCL4,AICL3,CH3CN,H2,N2,Ar,CH,CO,CO2,HCI,H2S

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Precision 1800C Silicon Carbide Reaction Sintering Furnace with ≤±5C Temperature Uniformity

Max.working Temperature: 1800℃

Temperature Uniformity: ≤±5℃

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High Temperature Industrial Purification Furnace For Graphite Materials

Max.working Temperature: 2400℃

Temperature Uniformity: ≤±10℃

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800-1300°C super high vacuum and high temperature batch system brazing furnace for steel or copper materials

Max.working Temperature(℃): 1300

Temperature Uniformity(℃）: ≤±3

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320KVA Siemens PLC Control High Temperature Vacuum Furnace

Structure: Single Chamber,horizental Type

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Silicon Carbide CVD Coating Furnace For Graphite Susceptor Or Etching Ring

Packaging Details: wooden cases

Delivery Time: 5-6monthes

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China CVD Furnace Manufactures , Silicon Carbide Coating Machine

Effecive Space(mm): 1000*1000*1500

Heating Power(KVA): 300

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Customized Vacuum Heat Treatment Furnace Customized Size And Configuration

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Structure: Single Chamber,horizental Type

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Positive / Negative Pressure Dewaxing Sinter Hip Furnace 10 Bar 60bar 100bar

Warranty: 1 Year

Weight: 2t-35t

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Furnace Shell: Carbon/stainless Steel

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RDE Silicon Carbide Coating Machine CVD Chemical Vapor Deposition Furnace

Effecive Space(mm): 1000*1000*1500

Heating Power(KVA): 300

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Effecive Space(mm): 1000*1000*1500

Heating Power(KVA): 300

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Silicon Nitride Ceramic Sintering Furnace with 60 bar Pressure and Customizable Working Space

Working Space: 400*400*1200mm, Or Customized According To Customer Needs

Working Pressure: 60 Bar

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Chemical Vapor Deposition Coating Furnace For Cemented/tungsten Carbide Cutting Tool

Process Temperature((℃): 700-1050

Precursors And Process Gases: TiCL4,AICL3,CH3CN,H2,N2,Ar,CH,CO,CO2,HCI,H2S

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6MPa Sinter HIP Furnace Durable Working Life and Dimension Of Furnace 4500x5400x3500mm for Industrial

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20 / 24 / 34 Ton Weight Sinter HIP Furnace Cooling Water Flow Rate 600 L/Min

Customizable TiC/TiN/TiCN/Al2O3 Coating CVD Furnace with 700-1050C Process Temperature

Advanced CVD/CVI Vapor Deposition Furnace for TiC TiN TiCN a-AL2O3 and K-AI2O3 Coating at 700-1050C Process Temperature

Chemical Vapor Deposition Coating Furnace With TiCL4,AICL3 Precursors And Process Gases

Precision 1800C Silicon Carbide Reaction Sintering Furnace with ≤±5C Temperature Uniformity

High Temperature Industrial Purification Furnace For Graphite Materials

800-1300°C super high vacuum and high temperature batch system brazing furnace for steel or copper materials

320KVA Siemens PLC Control High Temperature Vacuum Furnace

Silicon Carbide CVD Coating Furnace For Graphite Susceptor Or Etching Ring

China CVD Furnace Manufactures , Silicon Carbide Coating Machine

Customized Vacuum Heat Treatment Furnace Customized Size And Configuration

Positive / Negative Pressure Dewaxing Sinter Hip Furnace 10 Bar 60bar 100bar

High Temperature Vacuum Controlled Atmosphere Furnaces With Hot Zone

RDE Silicon Carbide Coating Machine CVD Chemical Vapor Deposition Furnace

HTCVD Silicon Carbide CVD SIC Epitaxy Growth Furnace Multiple Temperature Control Zones

Silicon Nitride Ceramic Sintering Furnace with 60 bar Pressure and Customizable Working Space

Chemical Vapor Deposition Coating Furnace For Cemented/tungsten Carbide Cutting Tool